We propose a new next-event estimation (NEE) technique for Gaussian Process Implicit Surfaces (GPISes). We show that the distribution of surface normals available for sampling at a GPIS hit point collapses from 2D to 1D as the GPIS realizations approach heightfields, causing existing NEE to fail entirely in this limit. We analyze this collapse and develop a new strategy that directly importance samples the resulting 1D arc of valid scattering directions restricted to the spherical cap towards a light source. Our technique enables NEE on heightfield GPISes for the first time and provides substantial variance reduction for highly anisotropic near-heightfield configurations. We combine our strategy with existing techniques via multiple importance sampling for robust performance across all degrees of anisotropy, and support arbitrary emitter shapes via sphere proxies.
We thank the anonymous reviewers for their helpful suggestions and the members of the Dartmouth Visual Computing Lab for valuable discussions. This work was supported by NSF award 2440472.
@article{shi26cpnee,
author = {Shi, Song and Xu, Kehan and Jarosz, Wojciech},
title = {Conditional Product Next Event Estimation for {Gaussian} Process Implicit Surfaces},
journal = {Computer Graphics Forum (Proceedings of EGSR)},
day = {1},
month = jul,
volume = {45},
number = {4},
year = {2026},
doi = {10/rngs},
publisher = {The Eurographics Association and John Wiley \\& Sons Ltd.}
}